邹金桥,祝勇仁,卢建树.涂层超导体缓冲层的制备[J].表面技术,2007,36(5):81-83.
ZOU Jin-qiao,ZHU Yong-ren,LU Jian_shu.Deposition of Buffer Layers for Coated Superconductors[J].Surface Technology,2007,36(5):81-83 |
| 涂层超导体缓冲层的制备 |
| Deposition of Buffer Layers for Coated Superconductors |
| 投稿时间：2007-06-07 修订日期：2007-10-10 |
| DOI： |
| 中文关键词: 涂层超导体 缓冲层 真空沉积 非真空沉积 |
| 英文关键词:Coated superconductor Buffer layer Vacuum deposition Non-vacuum deposition |
| 基金项目: |
|
|
|
|
| 摘要点击次数: |
| 全文下载次数: |
| 中文摘要: |
| 综述了涂层超导体缓冲层的作用、可利用的材料及制备方法。着重介绍了几种制备缓冲层的真空及非真空方法，即磁控溅射法、脉冲激光沉积(PLD)、溶胶一凝胶法(sol-gel)、电沉积等。展望了对下一步涂层超导体缓冲层的制备。 |
| 英文摘要: |
| The functions, usable materials and deposition of buffer layers for coated superconductors were reviewed. From the viewpoint of vacuum and non-vacuum deposition of buffer layers , several primary methods were emphasized, such as magnetic sputtering, PLD, sol-gel and electrodeposition. The prospect for preparing the buffer layers for coated superconductors was put forward. |
| 查看全文 查看/发表评论 下载PDF阅读器 |
| 关闭 |
渝公网安备 50010702501715号