刘敬明,吕反修.CVD自支撑金刚石厚膜的氧化动力学研究[J].表面技术,2007,36(4):7-10.
LIU Jing-ming,LV Fan-xiu.The Study on the Oxidation Kinetics of CVD Free-standing Diamond Films[J].Surface Technology,2007,36(4):7-10 |
| CVD自支撑金刚石厚膜的氧化动力学研究 |
| The Study on the Oxidation Kinetics of CVD Free-standing Diamond Films |
| 投稿时间：2007-03-13 修订日期：2007-08-10 |
| DOI： |
| 中文关键词: CVD金刚石膜 高温氧化 氧化动力学 |
| 英文关键词:CVD diamond films High temperature oxidation Oxidation kinetics |
| 基金项目:北京市自然科学基金( SZR051)；北京市科技新星计划资助项目( xx055)。 |
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| 中文摘要: |
| 为了了解直流等离子喷射CVD自支撑金刚石膜高温氧化机理，利用热失重的方法研究了金刚石膜在不同温度、不同氧浓度条件下的氧化反应。结果表明：CVD金刚石膜氧化反应中的反应指数大约为0.63，氧化反应的激活能为220kj/mol。通过X-Ray和Raman分析可知，CVD金刚石膜的氧化经历3个过程：1）金刚石膜表面氢的解吸和氧的吸附；2）金刚石与氧发生化学反应；3）金刚石氧化产物(CO、C02)的解吸。 |
| 英文摘要: |
| The kinetics of reaction between the DC arc plasma jet CVD free-standing diamond films and oxygen gas was studied by thermogravimetry in order to understand the mechanism of the oxidation of that. The results indicate that the apparent order of the reaction is about 0. 63 , and the apparent activation energy is 220kj/mol. From the result of X-ray and Raman we know that three stage mechanistic schemes are developed involving desorption of hydrogen and adsorption of oxygen on CVD diamond surface, surface chemical reaction, and desorption of adsorbed species to CO or C02. |
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