寿莎.蘸水笔刻蚀技术( DPN)影响因素分析[J].表面技术,2007,36(2):6-8,11.
SHOU Sha.Analysis of Influence Factors of Dip-pen Nanolithography[J].Surface Technology,2007,36(2):6-8,11 |
| 蘸水笔刻蚀技术( DPN)影响因素分析 |
| Analysis of Influence Factors of Dip-pen Nanolithography |
| 投稿时间：2006-11-27 修订日期：2007-04-10 |
| DOI： |
| 中文关键词: 蘸水笔 原子力显微镜 纳米结构 刻蚀 |
| 英文关键词:Dip-pen nanolithography Atomic force microscopy Nanostructure Lithography |
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| 中文摘要: |
| 蘸水笔技术( Dip-Pen)是近年来发展起来的一种新的扫描探针刻蚀加工技术，有着广泛的应用前景。该技术是直接把弯曲形水层作为媒介来转移“墨汁”分子，在样品表面形成纳米结构。尖端曲率半径、针尖在基底表面滞留时间、针尖扫描速度、空气湿度、表面粗糙度等均会影响纳米结构的线宽。针尖在基底表面滞留时间与圆半径的平方成一次函数关系，线宽随着尖端半径的增大而变宽，扫描速度与线宽成反比关系。通过控制湿度可以控制“墨水”分子的转移速度，从而影响纳米结构的线宽。线宽随着样品表面粗糙度增加而变宽。 |
| 英文摘要: |
| Dip-pen nanolithography is a new scanning probe lithography ( SPL) technique based on atomic force miroscopy ( AFM) , and now have made a great progress. DPN directly transfers 6'1iquid ink" to substrate by water meniscus in order to form nanostructures. The line width of nanostructures is influenced by many factors such as tip curvature radius, detained time in the base surface, scanning speed, humidity, surface roughness etc. The time of tip end relation being held up in the face of the substitute and round radius square outside are ready-made a function. The line relaxes with tip end radius enhancing but is changed into width, scanning speed and the line broad become inverse relation, by the fact that the molecule controlling humidity being able to control ink changing speed, affecting the line width of nanostructur, thereby. The line broad increases and is changed into width with sample surface roughness. |
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